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Home > Archives > Vol. 8 No. 3(Published) > Original Research Article
ACE-5673

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2025-08-26

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Vol. 8 No. 3(Published)

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Original Research Article

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Copyright (c) 2025 Ismail Benchebiba, Mohamed Mostefaoui, Abdelatif Gadoum, Ahmed Nour El Islam Ayad, Djilali Benyoucef

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Ismail Benchebiba, Mohamed Mostefaoui, Abdelatif Gadoum, Ahmed Nour El Islam Ayad, & Djilali Benyoucef. (2025). Numerical simulation of dielectric barrier discharge in Ar/He and Ar/O2 mixtures at atmospheric pressure. Applied Chemical Engineering, 8(3), ACE-5673. https://doi.org/10.59429/ace.v8i3.5673
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Numerical simulation of dielectric barrier discharge in Ar/He and Ar/O2 mixtures at atmospheric pressure

Ismail Benchebiba

LGEER Laboratory, Faculty of Technology, Hassiba Benbouali University of Chlef, 02000, Algeria

Mohamed Mostefaoui

LGEER Laboratory, Faculty of Technology, Hassiba Benbouali University of Chlef, 02000, Algeria

Abdelatif Gadoum

1 LGEER Laboratory, Faculty of Technology, Hassiba Benbouali University of Chlef, 02000, Algeria 2 Electrical Engineering Department Faculty of Applied Sciences, Kasdi Merbah University of Ouargla, 30000, Algeria 3 LRPPS Laboratory, Faculty of Mathematics and Material Sciences, Kasdi Merbah University of Ouargla, 30000, Algeria

Ahmed Nour El Islam Ayad

2 Electrical Engineering Department Faculty of Applied Sciences, Kasdi Merbah University of Ouargla, 30000, Algeria ; 4 APELEC Laboratory, Djilali Liabes University, Sidi Bel Abbes, 22000, Algeria

Djilali Benyoucef

LGEER Laboratory, Faculty of Technology, Hassiba Benbouali University of Chlef, 02000, Algeria


DOI: https://doi.org/10.59429/ace.v8i3.5673


Keywords: atmospheric pressure; dielectric barrier discharge; plasma density; permittivity; temperature; gas mixtures


Abstract

This study presents a numerical investigation of dielectrique barrier discharge (DBD) at atmospheric pressure, focusing on two gas mixture: Ar/He and Ar/O2. The objective is to analyse the impact of dielectric permittivity on the plasma behavior in the Ar/He mixture, and the influence of the gas temperature in the Ar/O2 mixture. For the Ar/He case, the relative permittivity of the dielectric is varied from 2 to 12, considering 7 species and 10 chemical reactions. In the Ar/O₂ case, the gas temperature is increased from 350 K to 600 K, with 9 species and 24 chemical reactions taken into account. Key plasma parameters such as species number densities (both neutral and charged), electron temperature, and electron density are evaluated for each scenario. Simulation results for the Ar/He mixture show that increasing dielectric permittivity does not affect the number densities of Ar, He, He⁺, or Hes, but leads to increased densities of electrons, Ars, Ar⁺, and a rise in electron temperature. For the Ar/O₂ mixture, increasing gas temperature causes a reduction in all species densities, while simultaniously increasing the electron temperature.


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